Electrical Conduction Mechanisms of Pure and Fe Doped TiO2 thin Films for IC Technology

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Research ID WM94P

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Abstract

Sol-gel dip coating was used to obtain undoped and Fe doped TiO 2 thin films deposited on ITO (Indium tin oxide) coated glass substrate. These films were sintered at 500 ‹? C for 1 hour. The particle size decreases with increase in Fe concentration. The electrical properties were analyzed by Electrometer in the voltage range -30V to +30V. We examined the various conduction mechanisms i.e. Schottky mechanism, Poole Frenkle mechanism, ohmic and space charge limited current mechanism etc. The dominant conduction mechanism is space charge and Pool-Frenkel conduction mechanism. These conduction mechanisms depend upon the deposition parameters like sintering temperature, nature of substrate, thickness of films, nature and amount of dopant.

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Conflict of Interest

The authors declare no conflict of interest.

Ethical Approval

Not applicable

Data Availability

The datasets used in this study are openly available at [repository link] and the source code is available on GitHub at [GitHub link].

Funding

This work did not receive any external funding.

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  • Classification

    FOR Code: 090699

  • Version of record

    v1.0

  • Issue date

    21 December 2019

  • Language

    en

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